连续回转PECVD系统 BTF-1200C-RP-PECVD
连续回转PECVD系统 BTF-1200C-RP-PECVD

BTF-1200C-RP-PECVD连续回转PECVD系统 BTF-1200C-RP-PECVD

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2020-04-07 09:31:49
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安徽贝意克设备技术有限公司

安徽贝意克设备技术有限公司

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产品简介

该款设备是全自动Plasma增强CVD系统(PECVD),连续可控温度以及Plasma强度等,配备真空系统,可以低压条件下实现工艺,PECVD系统能使整个实验腔体都处于辉光产生区,辉光相对均匀等效,很好的解决了传统等离子工作不稳定状态,该设备炉管可360°旋转,有助于粉料的烧结更均匀,可大角度倾斜,方便进出料,倾斜角度在0-35°之间,所有物料经过的管道都选用非金属材质,如:进出料腔体选用石英材质

详细介绍

技术参数

加热系统Heating system

功率Power

4KW

电压Voltage

AC220V  50/60Hz

zui高温度Max. Temp

1200°C

使用温度Working temp

1100°C

加热长度Heating zone length

200mm+200mm

恒温长度Constant zone length

250mm



控温方式Temperature Controller

 

PID automatic control and auto-tune function.

模糊PID控制和自整定调节

30 programmable segments for precise thermal processing.

智能化30段可编程控制

Built-in protection for the over-heated and broken thermocouple. 

超温和断偶报警功能

Operation interface is10 "LCD touch screen control

操作界面为10 "液晶触摸屏控制

控温精度Temperature Accuracy

+/- 1℃

炉管尺寸Tube Size

Size:Φ60*420+Φ100*360+Φ60*420mm

尺寸:Φ60*420+Φ100*360+Φ60*420mm

Furnace tube rotation rate:0~60r/min

炉管转速:0~60r/min

Furnace body inclination angle

0~35°(adjustable)

Plasma系统Plasma system

本系统借助于辉光放电产生等离子体,辉光放电等离子体中,电子密度高,通过反应气态放电,有效利用了非平衡等离子体的反应特征,从根本上改变了反应体系的能量供给方式。

The system generates plasma by means of glow discharge. In the glow discharge plasma, the electron density is high, and the reaction characteristics of the non-equilibrium plasma are effectively utilized by the reaction gas discharge, which fundamentally changes the energy supply mode of the reaction system.

进料系统Feeding system

送料系统速度连续可调,停止送料且炉体倾斜zui大时,物料不会从送料系统外漏,送料系统方便拆卸,拆卸后可手动加料,设备可正常运行。

The speed is continuously adjustable. When the feeding is stopped and the furnace body is tilted to the maximum, the material will not leak . The feeding system is easy to disassemble, and the material can be manually fed after disassembly, and the equipment can operate normally.

出料系统Discharge system

出料系统在炉体倾斜出料时可自动出料。)

The discharging system can automatically discharge when the furnace body is inclined and discharged.

气体控制系统Gas control system

该控气系统是可以控制两种气体按照不同流量进行混合配比的,也可以独立控制,质量流量计安装于密封的可移动的机柜内,由超洁双抛不锈钢管与精密双卡套接头连接组成。

The gas control system can control the mixing ratio of the two gases according to different flow rates, and can also be independently controlled. The mass flow meter is installed in a sealed movable cabinet, which is composed of super clean stainless steel tube and the precision double ferrule joint.

 

低真空系统Low vacuum system

该系统配备真空机械泵,可以抽真空,可以让设备在真空环境下进行反应。

 

Equipped with a vacuum mechanical pump that can be vacuumed to allow the unit to react in a vacuum environment.

气料分离系统Separation system

该系统可以让设备在充气体保护或者抽真空时,实现气体与物料的分离。

the system allows the separation of gas and material during the protection of the inflator or when vacuuming.

 

过滤系统filtering system

该系统可防止物料进入真空泵,保证真空泵的正常运行。

The system prevents material from entering the vacuum pump and ensures proper operation of the vacuum pump.

炉管转动系统Furnace tube rotation system

炉管转动系统可以让炉管360°匀速转动,转速在0-60r/min连续可调,且能在60r/min转速下长时间运行。   

Allows the  tube to rotate 360° at a constant speed. The rotation speed is continuously adjustable from 0 to 60 r/min for a long time.

 

 

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